Welcome to visit Kuntai at ITMA Shanghai from Oct 14-18th, 2024

Almost everybody in the textile industry knows about ITMA exhibition, because this exhibition is Asia's leading business platform for textile machinery, which brings together the strengths of the world-renowned ITMA brand and CITME - China's most important textile event. This year, it takes place from Oct 14-18th, 2024 in National Exhibition and Convention Center, Shanghai, China. Kuntai will showcase the latest textile machinery in this exhibition.

Our booth number is H5E18. Welcome to visit us to see our machine and discuss about the plans and developments in textile industry!

This time, Kuntai will bring the main body of hot melt PUR lamination machine to the exhibition. As known to all, now more and more people choose to use hot melt PUR glue in various materials lamination, such as shoes materials, garment materials, functional textiles, home textiles, etc. Users are transiting from functionality to health and sustainability. Kuntai now provides full range of laminating coating technologies and other textile finishing designs, catering to various requirements of application in different sectors of our life.

From dot transfer coating to full roller coating, from powder scattering to glue spraying to prepreg technology, from heating oven to double belt press incorporating both heating-pressing-cooling in one whole section, Kuntai designs and manufactures full types of the machines as per different application requirements, leading the laminating and finishing industry both China and abroad.

With a stellar track record, ITMA ASIA + CITME 2024 will continue to serve as the leading-edge business platform in Asia for textile machinery manufacturers to extend their reach into the thriving market and to build quality connections with buyers exploring advanced manufacturing technologies. Same as ITMA, Kuntai will continue to keep up the leading place in coating laminating and textile finishing industry and develop more and more new products catering to new and modern application requirements.